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Markus Ratzke

Markus Ratzke,Brandenburgische Technische Universität Cottbus,New Materials,Electrical & Electronic Engineering,Nanotechnology

Markus Ratzke

Brandenburgische Technische Universität Cottbus

Publications: 10 | Citations: 16

Fields: New Materials, Electrical & Electronic Engineering, Nanotechnology

Collaborated with 26 co-authors from 2002 to 2008 | Cited by 70 authors

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Publications (10)

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Morphology and Composition of Selected High-k Materials and Their Relevance to Dielectric Properties of Thin Films (Citations: 1)

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Journal: Journal of The Electrochemical Society - J ELECTROCHEM SOC , vol. 155, no. 5, 2008

Control parameters in pattern formation upon femtosecond laser ablation (Citations: 4)

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Journal: Applied Surface Science - APPL SURF SCI , vol. 253, no. 19, pp. 7932-7936, 2007

On the reliability of scanning probe based electrostatic force measurements (Citations: 1)

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Journal: Microelectronic Engineering - MICROELECTRON ENG , vol. 84, no. 3, pp. 512-516, 2007

Properties of dislocation networks formed by Si wafer direct bonding (Citations: 3)

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Journal: Materials Science in Semiconductor Processing - MATER SCI SEMICOND PROCESS , vol. 9, no. 1, pp. 96-101, 2006

Electrical properties of laser-ablation-initiated self-organized nanostructures on silicon surface (Citations: 1)

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Journal: Materials Science and Engineering B-advanced Functional Solid-state Materials , vol. 134, no. 2, pp. 114-117, 2006

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Citations (16 times by 14 publications)

Optimization Parameters of Femtosecond Laser Isolation Processing for a Microcrystalline Silicon Thin Film Solar Cell

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Journal: Materials and Manufacturing Processes - MATER MANUF PROCESS , vol. just-accep, no. just-accep, 2011

High-resolution investigations of ripple structures formed by femtosecond laser irradiation of silicon (Citations: 1)

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Journal: Analytical and Bioanalytical Chemistry - ANAL BIOANAL CHEM , vol. 396, no. 5, pp. 1905-1911, 2010

Formation of microtower structures on nanosecond laser ablation of liquid metals

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Journal: Applied Physics A-materials Science & Processing - APPL PHYS A-MAT SCI PROCESS , vol. 98, no. 2, pp. 393-400, 2010

Atomic Layer Deposition of High-Permittivity Yttrium-Doped HfO[sub 2] Films (Citations: 6)

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Journal: Electrochemical and Solid State Letters - ELECTROCHEM SOLID STATE LETT , vol. 12, no. 1, 2009

Properties of HfO 2 thin films prepared by dual-ion-beam reactive sputtering

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Journal: Optics and Laser Technology - OPT LASER TECHNOL , vol. 41, no. 6, pp. 820-822, 2009

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