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Co-authors
(145)
Serge Biesemans
12
Tom Schram
12
Mong Song Liang
12
Shih Chang Chen
11
Stefan De Gendt
9
Conferences
(6)
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5
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(3)
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Authors
Vincent S. Chang
Vincent S. Chang,Taiwan Semiconductor Manufacturing Company, Limited,Electrical & Electronic Engineering,Computer Science,Manufacturing Technology
Edit
Vincent S. Chang
Taiwan Semiconductor Manufacturing Company, Limited
Publications:
27
|
Citations:
94
Fields:
Electrical & Electronic Engineering
,
Computer Science
,
Manufacturing Technology
View FAQ about top research areas and Fields of study
Collaborated with
145 co-authors
from 2003 to 2008
|
Cited by
361 authors
Cumulative
Annual
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Publications
(27)
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32nm gate-first high-k/metal-gate technology for high performance low power applications
(
Citations: 11
)
C. H. Diaz
,
K. Goto
,
H. T. Huang
,
Yu. Yasuda
,
C. P. Tsao
,
T. T. Chu
,
W. T. Lu
,
V. Chang
,
Y. T. Hou
,
Y. S. Chao
,
P. F. Hsu
,
C. L. Chen
http://academic.research.microsoft.com/io.ashx?type=5&id=50734972&selfId1=22319432&selfId2=0&maxNumber=12&query=
Conference:
International Electron Devices Meeting - IEDM
, pp. 1-4, 2008
Strain enhanced low-VT CMOS featuring La/Al-doped HfSiO/TaC and 10ps invertor delay
(
Citations: 3
)
S. Kubicek
,
T. Schram
,
E. Rohr
,
V. Paraschiv
,
R. Vos
,
M. Demand
,
C. Adelmann
,
T. Witters
,
L. Nyns
,
A. Delabie
,
L.-A. Ragnarsson
,
T. Chiarella
V. S. Chang
http://academic.research.microsoft.com/io.ashx?type=5&id=50667153&selfId1=22319432&selfId2=0&maxNumber=12&query=
Conference:
VLSI Technology, Symposium - VLSIT
, 2008
The Impact of Stacked Cap Layers on Effective Work Function With HfSiON and SiON Gate Dielectrics
(
Citations: 3
)
Hag-Ju Cho
,
Hong Yu Yu
,
Vincent S. Chang
,
Amal Akheyar
,
Stefan Jakschik
,
Thierry Conard
,
Thomas Hantschel
,
Annelies Delabie
,
Christoph Adelmann
,
Sven Van Elshocht
,
Lars-Åke Ragnarsson
,
Tom Schram
http://academic.research.microsoft.com/io.ashx?type=5&id=27064269&selfId1=22319432&selfId2=0&maxNumber=12&query=
Journal:
IEEE Electron Device Letters - IEEE ELECTRON DEV LETT
, vol. 29, no. 7, pp. 743-745, 2008
Novel process to pattern selectively dual dielectric capping layers using soft-mask only
(
Citations: 2
)
T. Schram
,
S. Kubicek
,
E. Rohr
,
S. Brus
,
C. Vrancken
,
S.-Z. Chang
,
V. S. Chang
,
R. Mitsuhashi
,
Y. Okuno
,
A. Akheyar
,
H.-J. Cho
,
J. C. Hooker
http://academic.research.microsoft.com/io.ashx?type=5&id=50667120&selfId1=22319432&selfId2=0&maxNumber=12&query=
Conference:
VLSI Technology, Symposium - VLSIT
, 2008
Anomalous positive-bias temperature instability of high-κ/metal gate nMOSFET devices with Dy2O3 capping
R. O'Connor
,
V. S. Chang
,
L. Pantisano
,
L.-A. Ragnarsson
,
M. Aoulaiche
,
B. O'Sullivan
,
C. Adelmann
,
S. Van Elshocht
,
P. Lehnen
,
HongYu Yu
,
G. Groeseneken
Conference:
Reliability Physics, Annual International Symposium - IRPS
, 2008
Sort by:
Citations
(94 times by 84 publications)
Understanding the Potential and the Limits of Germanium pMOSFETs for VLSI Circuits From Experimental Measurements
(
Citations: 3
)
P. Magnone
,
F. Crupi
,
M. Alioto
,
B. Kaczer
,
B. De Jaeger
Journal:
IEEE Transactions on Very Large Scale Integration Systems - VLSI
, vol. 19, no. 9, pp. 1569-1582, 2011
Characterization of Enhanced Stress Memorization Technique on nMOSFETs by Multiple Strain-Gate Engineering
Tsung-Yi Lu
,
Tien-Shun Chang
,
Shih-An Huang
,
Tien-Sheng Chao
Journal:
IEEE Transactions on Electron Devices - IEEE TRANS ELECTRON DEVICES
, vol. 58, no. 4, pp. 1023-1028, 2011
Effect of $\hbox{NH}_{3}$ Plasma Nitridation on Hot-Carrier Instability and Low-Frequency Noise in Gd-Doped High$ \kappa$ Dielectric nMOSFETs
Yu-Ting Chen
,
Kun-Ming Chen
,
Cheng-Li Lin
,
Wen-Kuan Yeh
,
Guo-Wei Huang
,
Chien-Ming Lai
,
Yi-Wen Chen
,
Che-Hua Hsu
,
Fon-Shan Huang
Journal:
IEEE Transactions on Electron Devices - IEEE TRANS ELECTRON DEVICES
, vol. 58, no. 3, pp. 812-818, 2011
Impact of HK / MG stacks and future device scaling on RTN
Naoki Tega
,
Hiroshi Miki
,
Zhibin Ren
,
Christoper P. D'Emic
,
Yu Zhu
,
David J. Frank
,
Michael A. Guillorn
,
Dae-Gyu Park
,
Wilfried Haensch
,
Kazuyoshi Torii
Published in 2011.
Relative benefits of technology and occupant behaviour in moving towards a more energy efficient, sustainable housing paradigm
Brian Pilkington
,
Richard Roach
,
James Perkins
Journal:
Energy Policy - ENERG POLICY
, vol. 39, no. 9, pp. 4962-4970, 2011
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