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Co-authors
(328)
David C. Ahlgren
26
Gregory Freeman
25
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24
Robert A. Groves
23
Kathryn Schonenberg
22
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Academic
Authors
Kenneth J. Stein
Kenneth J. Stein,IBM,Electrical & Electronic Engineering,Computer Science
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Kenneth J. Stein
IBM
Publications:
50
|
Citations:
851
Fields:
Electrical & Electronic Engineering
,
Computer Science
View FAQ about top research areas and Fields of study
Collaborated with
328 co-authors
from 1991 to 2010
|
Cited by
1942 authors
Cumulative
Annual
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Publications
(50)
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RefWorks
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Performance elements for 28nm gate length bulk devices with gate first high-k metal gate
J. Yuan
,
C. Gruensfelder
,
K. Y. Lim
,
T. Wallner
,
M. K. Jung
,
M. J. Sherony
,
Y. M. Lee
,
J. Chen
,
C. W. Lai
,
Y. T. Chow
,
K. Stein
,
L. Y. Song
http://academic.research.microsoft.com/io.ashx?type=5&id=50996597&selfId1=824574&selfId2=0&maxNumber=12&query=
Conference:
International Conference on Solid-State and Integrated Circuit Technology - ICSICT
, 2010
High-κ/metal gate low power bulk technology - Performance evaluation of standard CMOS logic circuits, microprocessor critical path replicas, and SRAM for 45nm and beyond
D.-G. Park
,
K. Stein
,
K. Schruefer
,
Y. Lee
,
J.-P. Han
,
W. Li
,
H. Yin
,
C. Pacha
,
N. Kim
,
M. Ostermayr
,
M. Eller
,
S. Kim
http://academic.research.microsoft.com/io.ashx?type=5&id=50767280&selfId1=824574&selfId2=0&maxNumber=12&query=
Conference:
International Symposium on VLSI Technology, Systems and Applications - VLSI-TSA
, pp. 90-92, 2009
A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process
(
Citations: 32
)
X. Chen
,
S. Samavedam
,
V. Narayanan
,
K. Stein
,
C. Hobbs
,
C. Baiocco
,
W. Li
,
D. Jaeger
,
M. Zaleski
,
H. S. Yang
,
N. Kim
,
Y. Lee
http://academic.research.microsoft.com/io.ashx?type=5&id=50667136&selfId1=824574&selfId2=0&maxNumber=12&query=
Conference:
VLSI Technology, Symposium - VLSIT
, 2008
Scaling of 32nm low power SRAM with high-K metal gate
(
Citations: 22
)
H. S. Yang
,
R. Wong
,
R. Hasumi
,
Y. Gao
,
N. S. Kim
,
D. H. Lee
,
S. Badrudduza
,
D. Nair
,
M. Ostermayr
,
H. Kang
,
H. Zhuang
,
J. Li
K. Stein
http://academic.research.microsoft.com/io.ashx?type=5&id=50734866&selfId1=824574&selfId2=0&maxNumber=12&query=
Conference:
International Electron Devices Meeting - IEDM
, pp. 1-4, 2008
Scalability of Direct Silicon Bonded (DSB) Technology for 32nm Node and Beyond
(
Citations: 1
)
Haizhou Yin
,
C. Y. Sung
,
K. L. Saenger
,
M. Hamaguchr
,
R. Hasumi
,
K. Ohuchr
,
H. Ng
,
R. Zhang
,
K. J. Stein
,
T. A. Wallner
,
J. Li
,
J. A. Ott
http://academic.research.microsoft.com/io.ashx?type=5&id=50582395&selfId1=824574&selfId2=0&maxNumber=12&query=
Conference:
VLSI Technology, Symposium - VLSIT
, 2007
Sort by:
Citations
(851 times by 658 publications)
Dual-polarized architecture for channel sounding at 60 GHz with digital/analog phase control based on 0.25µm SiGe BiCMOS and LTCC technology
(
Citations: 2
)
Alexis Paolo Garcia Ariza
,
Robert Muller
,
Frank Wollenschlager
,
Lei Xia
,
Mohamed Elkhouly
,
Yaoming Sun
,
Uwe Trautwein
,
Reiner S. Thoma
Published in 2011.
An analog perspective on device reliability in 32nm high-κ metal gate technology
(
Citations: 1
)
Florian Raoul Chouard
,
Shailesh More
,
Michael Fulde
,
Doris Schmitt-Landsiedel
Conference:
Workshop on Design and Diagnostics of Electronic Circuits and Systems - DDECS
, 2011
On the impact of gate oxide degradation on SRAM dynamic and static write-ability
(
Citations: 1
)
Vikas Chandra
,
Robert C. Aitken
Conference:
Asia and South Pacific Design Automation Conference - ASP-DAC
, pp. 707-712, 2011
Process Technology Variation
(
Citations: 1
)
Kelin J. Kuhn
,
Martin D. Giles
,
David Becher
,
Pramod Kolar
,
Avner Kornfeld
,
Roza Kotlyar
,
Sean T. Ma
,
Atul Maheshwari
,
Sivakumar Mudanai
Journal:
IEEE Transactions on Electron Devices - IEEE TRANS ELECTRON DEVICES
, vol. 58, no. 8, pp. 2197-2208, 2011
Transistor Mismatch Properties in Deep-Submicrometer CMOS Technologies
(
Citations: 1
)
Xiaobin Yuan
,
Takashi Shimizu
,
Umashankar Mahalingam
,
Jeffrey S. Brown
,
Kazi Z. Habib
,
Daniel G. Tekleab
,
Tai-Chi Su
,
Sarkar Satadru
,
C. Michael Olsen
,
Hyunwoo Lee
,
Li-Hong Pan
,
Terence B. Hook
http://academic.research.microsoft.com/io.ashx?type=5&id=51192643&selfId1=824574&selfId2=0&maxNumber=12&query=
Journal:
IEEE Transactions on Electron Devices - IEEE TRANS ELECTRON DEVICES
, vol. 58, no. 2, pp. 335-342, 2011
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