,Diamond Film,Diamond films

Diamond films is an interesting material for silicon-on-insulator technologies due to a unique combination of properties that can enhance to electronic device performance. Current CVD techniques for diamond growth allow the production of diamond layers with a thickness from less than 1 micron to a few mm on Si substrates of large area. As the direct diamond-to-silicon bonding requires high temperature (>1150°C) and still is problematic, the use of a Si substrate as the device layer after diamond deposition could be an alternative...

V. Ralchenko, et al. CVD Diamond Films for SOI Technologies