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Effects of Thermal Annealing on the Optical Properties of Nickel Oxide Thin Films Prepared by Chemical Bath Deposition Technique

Effects of Thermal Annealing on the Optical Properties of Nickel Oxide Thin Films Prepared by Chemical Bath Deposition Technique,H. U. Igwe,O. E. Ekpe

Effects of Thermal Annealing on the Optical Properties of Nickel Oxide Thin Films Prepared by Chemical Bath Deposition Technique   (Citations: 1)
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Nickel oxide thin films have been prepared by chemical bath deposition technique on glass substrates using 3 mls of 1M of NiSO4, 4 mls of 1M of KCl4, and 1M of Ammonia as the complexing agent. The films were subjected to post-deposition annealing under various temperatures, 100, 150, 200, and 300 0 C. The thermal treatment of Ni(OH)2 thin film decomposes to NiOx. The films are very prosperous materials with excellent electrochromic properties, firmly adhered to the substrate and resistant to chemicals. The percentage transmittance is very high while the percentage reflectance is low as the wavelength increases. The band gaps obtained under various thermal treatments are between 1.90eV and 4.4eV. The refractive index is between 0.00 and 3.00. The thickness achieved is in the range of 0.12-0.14μm. These properties of the oxide film supports other important application of NiO film such as preparation of alkaline batteries (as a cathode material) anti-ferromagnetic layers, P -type transparent conducting film.
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