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Method of Making an Electrostatic Chuck with Oxide Insulator Spinning Plate for Substrates Plasma Reactor for Processing Substrates Method and Structure for Interconnecting Different Polysilicon Zones on Semiconductor Substrates for Integrated Circuits Planarized Semiconductor Structure Using Subminimum Features

Method of Making an Electrostatic Chuck with Oxide Insulator Spinning Plate for Substrates Plasma Reactor for Processing Substrates Method and Structu

Method of Making an Electrostatic Chuck with Oxide Insulator Spinning Plate for Substrates Plasma Reactor for Processing Substrates Method and Structure for Interconnecting Different Polysilicon Zones on Semiconductor Substrates for Integrated Circuits Planarized Semiconductor Structure Using Subminimum Features  
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M. S. Barnes, R. P. Westerfield, G. Bohmer, J. Gentischer, R. Lehner, D. Modjesch, W. Schmutz, Y. H. Lee, J. R. Abernathey, R. W. Mann, P. C. Parries, Springer J. E. Croninhttp://academic.research.microsoft.com/io.ashx?type=5&id=13027854&selfId1=0&selfId2=0&maxNumber=12&query=
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