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Development of micromachining technology in ion microbeam system at TIARA, JAEA

Development of micromachining technology in ion microbeam system at TIARA, JAEA,10.1016/j.apradiso.2008.06.021,Applied Radiation and Isotopes,T. Kamiy

Development of micromachining technology in ion microbeam system at TIARA, JAEA  
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An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.
Journal: Applied Radiation and Isotopes - APPL RADIAT ISOTOPES , vol. 67, no. 3, pp. 488-491, 2009
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