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The influence of molecular weight on nanoporous polymer films

The influence of molecular weight on nanoporous polymer films,10.1016/S0032-3861(01)00376-7,Polymer,Ting Xu,Ho-Cheol Kim,Jason Derouchey,Chevey Seney,

The influence of molecular weight on nanoporous polymer films   (Citations: 21)
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Asymmetric diblock copolymers of polystyrene (PS) and poly(methylmethacrylate) (PMMA), PS(S-b-MMA), having cylindrical microdomains of PMMA, are model systems to generate nanoporous thin films. With controlled interfacial interactions or applied external electric fields, the cylindrical microdomains can be oriented normal to the surface. Exposure to deep UV radiation degrades the PMMA and crosslinks the PS matrix. After rinsing with a selective solvent, a nanoporous film is obtained. By changing the molecular weight, smooth porous films with hexagonal arrays of pores having diameters ranging from 14 to 50nm were obtained. The results show that molecular weight is a convenient, simple means of controlling pore diameter.
Journal: Polymer , vol. 42, no. 21, pp. 9091-9095, 2001
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    Jingwei Baiet al. Graphene nanomesh

    • ...We can also adjust the surface area increase of a shallow trench array through the trench diameter [7] – a dimension which can be tuned either via the initial polymer template [4, 18], or by using the pore-widening process demonstrated in Fig. 2b. In this case the original pore diameter (Fig. 2a) was widened through growth of 18nm sacrificial thermal oxide (which consumes ~9nm silicon) followed by an oxide strip...

    C. T. Black. Integration of self assembly for semiconductor microelectronics

    • ...In our experiment, we use diblock copolymers composed of 70% polystyrene (PS) and 30% poly(methyl-methacrylate) (PMMA) (70 : 30 PS : PMMA) with total molecular weight of 64 kg/mol, which form hexagonal lattices of 20-nmdiameter cylindrical PMMA domains (center-to-center spacing nm) in a matrix of PS. Intrinsic copolymer film dimensions can be adjusted via the copolymer molecular weight [14], [15]...

    Charles T. Blacket al. Nanometer-scale pattern registration and alignment by directed diblock...

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