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Precise Depth Control and Low-Damage Atomic-Layer Etching of HfO[sub 2] using BCl[sub 3] and Ar Neutral Beam

Precise Depth Control and Low-Damage Atomic-Layer Etching of HfO[sub 2] using BCl[sub 3] and Ar Neutral Beam,10.1149/1.2832427,Electrochemical and Sol

Precise Depth Control and Low-Damage Atomic-Layer Etching of HfO[sub 2] using BCl[sub 3] and Ar Neutral Beam  
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