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Effects of {Al}_{2}{O}_{3} Dielectric Cap and Nitridation on Device Performance, Scalability, and Reliability for Advanced High kappa/Metal Gate pMOSFET Applications

Effects of {Al}_{2}{O}_{3} Dielectric Cap and Nitridation on Device Performance, Scalability, and Reliability for Advanced High kappa/Metal Gate pMOSF

Effects of {Al}_{2}{O}_{3} Dielectric Cap and Nitridation on Device Performance, Scalability, and Reliability for Advanced High kappa/Metal Gate pMOSFET Applications  
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Journal: IEEE Transactions on Electron Devices - IEEE TRANS ELECTRON DEVICES , vol. 54, no. 10, pp. 2738-2749, 2007
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