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Performance Consideration of MOS and Junction Diodes for Varactor Application

Performance Consideration of MOS and Junction Diodes for Varactor Application,10.1109/TED.2007.903201,IEEE Transactions on Electron Devices,Yi-Jen Cha

Performance Consideration of MOS and Junction Diodes for Varactor Application   (Citations: 6)
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The engineering and tradeoffs for quality factor, capacitance tuning ratio, capacitance mismatch, and low- frequency noise for different varactor device structures, geometry sizes, and operations have been compared to provide a comprehensive guideline of an optimized structure for the advanced radio-frequency voltage-controlled oscillator (VCO). Compared with junction varactors, n+/n-well (NW) MOS varactors exhibit a higher capacitance tuning ratio (~3) and a superior capacitance mismatch (< 0.1% for a drawn size of 25 mum2). However, a noticeable low-frequency noise (~ 10-18 A2/Hz) was observed in the accumulation-mode n+/NW MOS varactors. A derived figure of merit in selecting a suitable varactor in terms of VCO's phase noise has been proposed for the first time. The measurement was performed by using the 0.18- mum 1P6M with AlCu backend wafer.
Journal: IEEE Transactions on Electron Devices - IEEE TRANS ELECTRON DEVICES , vol. 54, no. 9, pp. 2570-2573, 2007
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