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Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition

Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition,10.1016/j.apsusc.2005

Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition   (Citations: 8)
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Highly transparent conductive Al2O3 doped zinc oxide (AZO) thin films have been deposited on the glass substrate by pulsed laser deposition technique. The effects of substrate temperature and post-deposition annealing treatment on structural, electrical and optical properties of AZO thin films were investigated. The experimental results show that the electrical resistivity of films deposited at 240°C is 6.1×10−4Ωcm, which can be further reduced to as low as 4.7×10−4Ωcm by post-deposition annealing at 400°C for 2h in argon. The average transmission of AZO films in the visible range is 90%. The optical direct band gap of films was dependent on the substrate temperature and the annealing treatment in argon. The optical direct band gap value of AZO films increased with increasing annealing temperature.
Journal: Applied Surface Science - APPL SURF SCI , vol. 252, no. 5, pp. 1561-1567, 2005
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