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The Effect of Deposition Temperature and Postanneal on the Bi 3.63 Pr 0.3 Ti 3 O 12 thin Films Prepared by RF-Magnetron Sputtering Method

The Effect of Deposition Temperature and Postanneal on the Bi 3.63 Pr 0.3 Ti 3 O 12 thin Films Prepared by RF-Magnetron Sputtering Method,10.1111/j.15

The Effect of Deposition Temperature and Postanneal on the Bi 3.63 Pr 0.3 Ti 3 O 12 thin Films Prepared by RF-Magnetron Sputtering Method  
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Journal: Journal of The American Ceramic Society - J AMER CERAM SOC , vol. 92, no. 2, pp. 501-505, 2009
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