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Effect of RF power and sputtering pressure on the structural and optical properties of TiO 2 thin films prepared by RF magnetron sputtering

Effect of RF power and sputtering pressure on the structural and optical properties of TiO 2 thin films prepared by RF magnetron sputtering,10.1016/j.

Effect of RF power and sputtering pressure on the structural and optical properties of TiO 2 thin films prepared by RF magnetron sputtering  
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TiO2 thin films were deposited onto quartz substrates by RF magnetron sputtering. The samples deposited at various RF powers and sputtering pressures and post annealed at 873K, were characterized using X-ray diffraction (XRD), micro Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), UV–vis spectroscopy and photoluminescence (PL) spectroscopy. XRD spectrum indicates that the films are amorphous-like in nature. But micro-Raman analysis shows the presence of anatase phase in all the samples. At low sputtering pressure, increase in RF power favors the formation of rutile phase. Presence of oxygen defects, which can contribute to PL emission is evident in the XPS studies. Surface morphology is much affected by changes in sputtering pressure which is evident in the SEM images. A decrease in optical band gap from 3.65 to 3.58eV is observed with increase in RF power whereas increase in sputtering pressure results in an increase in optical band gap from 3.58 to 3.75eV. The blue shift of absorption edge in all the samples compared to that of solid anatase is attributed to quantum size effect. The very low value of extinction coefficient in the range 0.0544–0.1049 indicates the excellent optical quality of the samples. PL spectra of the films showed emissions in the UV and visible regions.
Journal: Applied Surface Science - APPL SURF SCI , vol. 257, no. 24, pp. 10869-10875, 2011
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