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A G&P EWMA algorithm for high-mix semiconductor manufacturing processes

A G&P EWMA algorithm for high-mix semiconductor manufacturing processes,10.1016/j.jprocont.2010.09.005,Journal of Process Control,Chun-Cheng Chang,Tia

A G&P EWMA algorithm for high-mix semiconductor manufacturing processes   (Citations: 1)
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In mixed run processes, typical in semiconductor manufacturing and other automated assembly-line type process, products with different recipes will be produced on the same tool. Product based run-to-run control can be applied to improve the process capability. The effect of product-based controller on low frequency products is, however, minimal, due to inability to track tool variations. In this work, we propose a group and product based EWMA control scheme which combines adaptive k-means cluster method and run-to-run EWMA control to improve the performance of low frequency products in the mixed run process. Similar products could be classified into the same group adaptively and controlled by a group EWMA controller. The group controller is updated by both low frequency products and similar high frequency products; so that low frequency products can be improved by shared information from similar large frequency products. However, the high frequency products are controlled by individual product-based EWMA to avoid interference of the low frequency products. The advantages of proposed control scheme are demonstrated by benchmark simulation and reversed engineered industrial applications.
Journal: Journal of Process Control - J PROCESS CONTROL , vol. 21, no. 1, pp. 28-35, 2011
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