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An Empirical Study of Photomask Manufacturing Productivity

An Empirical Study of Photomask Manufacturing Productivity,10.1109/ASMC.2006.1638798,C. Neil Berglund,Charles M. Weber,Cesar Castilla

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An Empirical Study of Photomask Manufacturing Productivity  
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A survey-based, empirical study of photomask manufacturing productivity has led to a few significant conclusions. Firstly, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Secondly, high downtime of pattern generation tools is limiting productivity. Thirdly, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale
Conference: Advanced Semiconductor Manufacturing, IEEE/SEMI Conference and Workshop - ASMC , pp. 439-445, 2006
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