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Keywords
(4)
Chemical Vapor Deposited
Focal Plane Array
Monolithic Integration
Technology Transfer
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Zero-bias Si backward diodes detectors incorporating P and B δ-doping layers grown by chemical vapor deposition
Zero-bias Si backward diodes detectors incorporating P and B δ-doping layers grown by chemical vapor deposition,10.1109/ISDRS.2009.5378255,Si-Young Pa
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Zero-bias Si backward diodes detectors incorporating P and B δ-doping layers grown by chemical vapor deposition
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Si-Young Park
,
R. Anisha
,
Sheng Jiang
,
Paul R. Berger
,
Roger Loo
,
Ngoc Duy Nguyen
,
Shotaro Takeuchi
,
Jozefien Goossens
,
Matty Caymax
For the first time, CVD-grown Si only backward diode detectors incorporating δ-doping planes were demonstrated. The best performance of curvature coefficient of 16 V-1 with a junction resistance of 14 kΩ was shown. By the successful
technology transfer
from LT-MBE to CVD, the eventual placement of optimized CVD-grown detectors monolithically integrated with 300 mm CMOS platform to fabricate large area focal plane arrays with low cost is now possible.
Conference:
Semiconductor Device Research International Symposium - ISDRS
, 2009
DOI:
10.1109/ISDRS.2009.5378255
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References
(4)
Backward Diodes for Low-level Millimeter-Wave Detection
(
Citations: 17
)
C. A. Burrus
Journal:
IEEE Transactions on Microwave Theory and Techniques - IEEE TRANS MICROWAVE THEORY
, vol. 11, no. 5, pp. 357-362, 1963
High-performance antimonide-based heterostructure backward diodes for millimeter-wave detection
(
Citations: 15
)
Patrick Fay
,
J. N. Schulman
,
D. H. Chow
,
Y. K. Boegeman
,
K. S. Holabird
Journal:
IEEE Electron Device Letters - IEEE ELECTRON DEV LETT
, vol. 23, no. 10, pp. 585-587, 2002
Sensitivity of Si-based zero-bias backward diodes for microwave detection
(
Citations: 3
)
S.-Y. Park
,
R. Yu
,
S.-Y. Chung
,
P. R. Berger
,
P. E. Thompson
,
P. Fay
Journal:
Electronics Letters - ELECTRON LETT
, vol. 43, no. 5, 2007
Lateral and vertical scaling of a QSA HBT for a 0.13μm 200GHz SiGe:C BiCMOS technology
(
Citations: 4
)
S. Van Huylenbroeck
,
A. Sibaja-Hernandez
,
A. Piontek
,
L. J. Choi
,
M. W. Xu
,
N. Ouassif
,
F. Vleugels
,
K. Van Wichelen
,
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,
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,
P. Leray
,
K. Devriendt
http://academic.research.microsoft.com/io.ashx?type=5&id=50381598&selfId1=0&selfId2=0&maxNumber=12&query=
Journal:
Procedia Engineering
, 2004