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Comparison of TiO2-doped SiO2 films from two organosilicon precursors

Comparison of TiO2-doped SiO2 films from two organosilicon precursors,10.1109/ACP.2010.5682745,Jaspal P. Bange,Lalit S. Patil,D. K. Gautam

Comparison of TiO2-doped SiO2 films from two organosilicon precursors  
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In present work the effect of two different source of silicon Tetraethylorthosilicate and Octamethylcyclotetrasiloxane on TiO2-doped SiO2 films have been studied. The study reveals that film properties depend on the precursors used for deposition. The optical, chemical and surface properties have been characterized using ellipsometer and SEM with EDAX.
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