Quasi2D Compact Modeling for Double-Gate MOSFET

Quasi2D Compact Modeling for Double-Gate MOSFET,Mansun Chan,Tze Yin Man,Jin He,Xuemei Xi,Chung-Hsun Lin,Xinnan Lin,Ping K. Ko,Ali M. Niknejad,Chenming

Quasi2D Compact Modeling for Double-Gate MOSFET   (Citations: 2)
BibTex | RIS | RefWorks Download
This paper presents an approach to model the characteristics of undoped Double-Gate MOSFETs without relying on the charge-sheet approximation. Due to the extremely thin silicon film used, the inversion charge thickness becomes comparable to the silicon film thickness and cannot be ignored. Together with volume inversion and quantum effect, the carriers are distributed along the vertical direction perpendicular to the direction of current flow. Therefore, a 2- D modeling approach considering vertical current distribution and lateral carrier transport is required. To simplify the 2-D problem, the quasi-Fermi potential has been taken as a reference to develop a quasi 2-D DG MOSFET model.
Published in 2004.
Cumulative Annual
View Publication
The following links allow you to view full publications. These links are maintained by other sources not affiliated with Microsoft Academic Search.
Sort by: