RSS for Sung-Ki Parkhttp://academic.research.microsoft.com/Rss.aspx?id=20981352Search RSS feed for Microsoft Academic SearchMSRA Libra RSS Burner(c)2008 Microsoft Corpration, All right reserved.Wed, 19 Jun 2013 01:54:41 GMTWed, 19 Jun 2013 01:54:41 GMTSung-Ki Park (Personal Info) http://academic.research.microsoft.com/Author/20981352Wed, 19 Jun 2013 01:54:41 GMTSeoul National University

Publications: 12

Citation Count: 9

G-index: 3

Field Rating: 2

Fields of study: Construction, Cement, Glass

Homepage:

Permanent Link: http://academic.research.microsoft.com/Author/20981352

]]>2098137323Seoul National UniversityThe Effect of Tunnel Barrier at Resistive Switching Device for Low Power Memory Applicationshttp://academic.research.microsoft.com/Publication/51056385Wed, 19 Jun 2013 01:54:41 GMT2098135251056385Hyejung Choi, Jaeyun Yi, Sangmin Hwang, Sangkeum Lee, Seokpyo Song, Seunghwan Lee, Jaeyeon Lee, Donghee Son, Suk-Ju Kim, Ja-Yong Kim, Sunghoon Lee, Jiwon Moon, Choidong Kim, Jungwoo Park, Moonsig Joo, JaeSung Roh, Sungki Park, Sung-Woong Chung, Junghoon Rhee, Sung Joo Hong

IMW, 2011

]]>Requirements of bipolar switching ReRAM for 1T1R type high density memory arrayhttp://academic.research.microsoft.com/Publication/51054218Wed, 19 Jun 2013 01:54:40 GMT2098135251054218Jaeyun Yi, Hyejung Choi, Seokpyo Song, Donghee Son, Sangkeum Lee, Wangee Kim, Mingyu Sung, Sunghoon Lee, Jiwon Moon, Choidong Kim, Jungwoo Park, Moonsig Joo, JaeSung Roh, Sungki Park, Sung-Woong Chung, Jaegoan Jeong, Sung-Joo Hong, Sung-Wook Park

VLSI-TSA, pp. 1-2, 2011

]]>The study of flat-band voltage shift using arsenic ion-implantation with High-k/Metal Inserted Poly Si gate stackshttp://academic.research.microsoft.com/Publication/51145020Wed, 19 Jun 2013 01:54:39 GMT2098135251145020BeomYong Kim, YunHyuck Ji, SeungMi Lee, BongSeok Jeon, KeeJeung Lee, Kwon Hong, SungKi Park

ESSDERC, pp. 79-82, 2011

]]>Mix proportion of high-strength, roller-compacted, latex-modified rapid-set concrete for rapid road repairhttp://academic.research.microsoft.com/Publication/49458357Wed, 19 Jun 2013 01:54:38 GMT2098135249458357Jong-Pil Won, Joon-Mo Kim, Su-Jin Lee, Sang-Woo Lee, Sung-Ki Park

CONSTR BUILD MATER, vol. 25, no. 4, pp. 1796-1800, 2011

]]>Stress induced self aligned contact failure during tungsten-poly gate process in sub-60 nm memory devicehttp://academic.research.microsoft.com/Publication/51106702Wed, 19 Jun 2013 01:54:37 GMT2098135251106702Min-Gyu Sung, Yong Soo Kim, Sung-Ki Park

IPFA, pp. 1-4, 2011

]]>Novel 3-dimensional Dual Control-gate with Surrounding Floating-gate (DC-SF) NAND flash cell for 1Tb file storage applicationhttp://academic.research.microsoft.com/Publication/51017581Wed, 19 Jun 2013 01:54:36 GMT2098135251017581SungJin Whang, KiHong Lee, DaeGyu Shin, BeomYong Kim, MinSoo Kim, JinHo Bin, JiHye Han, SungJun Kim, BoMi Lee, YoungKyun Jung, SungYoon Cho, ChangHee Shin, HyunSeung Yoo, SangMoo Choi, Kwon Hong, S. Aritome, SungKi Park, SungJoo Hong

IEDM, pp. 29.7.1-29.7.4, 2010

(Citations:3)

]]>Failure Analysis of an Anomalous Subthreshold Current in Nano-Scale NAND Flash Memoryhttp://academic.research.microsoft.com/Publication/50564091Wed, 19 Jun 2013 01:54:35 GMT2098135250564091Dong-Ho Lee, Seung-Woo Shin, Choon-Kun Ryu, Jae-Hoon Choi, Chae-Moon Lim, Noh-Yeal Kwak, Hyun-Soo Shon, Jaehyoung Koo, Kwon Hong, Byung-Seok Lee, Sung-Ki Park, Sung-Wook Park, Kae-Dal Kwack

IRPS, 2007

]]>Air-Gap Application and Simulation Results for Low Capacitance in 60nm NAND Flash Memoryhttp://academic.research.microsoft.com/Publication/50574710Wed, 19 Jun 2013 01:54:34 GMT2098135250574710Sukjoong Kim, Wheewon Cho, Junggeun Kim, Byungseok Lee, Sungki Park

NVSMW, 2007

]]>Improvement of within Wafer Uniformity of Device Parameters by Gradient Temperature Control with Bell Jar Hot Wall RTPhttp://academic.research.microsoft.com/Publication/50543600Wed, 19 Jun 2013 01:54:33 GMT2098135250543600KyungWon Lee, S. Kim, P. Frisella, B. Jacobs, G. Cai, R. Reece, NohYeal Kwak, ChulYoung Ham, KwangChul Joo, DongHo Lee, SangWook Park, SungKi Park

RTP, 2006

]]>The effect of mechanical stress from stopping nitride to the reliability of tunnel oxide and data retention characteristics of NAND FLASH memoryhttp://academic.research.microsoft.com/Publication/50479114Wed, 19 Jun 2013 01:54:32 GMT2098135250479114J. Om, Eunseok Choi, Sejun Kim, Heegee Lee, Yongwook Kim, Heenyun Chang, Sungki Park, Gihyun Bae

IRPS, 2005

]]>Effects of CH[sub 2]F[sub 2] Addition on a High Aspect Ratio Contact Hole Etching in a C[sub 4]F[sub 6]/O[sub 2]/Ar Plasmahttp://academic.research.microsoft.com/Publication/24464318Wed, 19 Jun 2013 01:54:31 GMT2098135224464318Hyun-Kyu Ryu, Byung-Seok Lee, Sung-Ki Park, Il-Wook Kim, Chang-Koo Kim

ELECTROCHEM SOLID STATE LETT, vol. 6, no. 9, 2003

(Citations:1)

]]>Novel shallow trench isolation process using flowable oxide CVD for sub-100 nm DRAMhttp://academic.research.microsoft.com/Publication/50291527Wed, 19 Jun 2013 01:54:30 GMT2098135250291527Sung-Woong Chung, Sang-Tae Ahn, Hyun-Chul Sohn, Jachun Ku, Sungki Park, Yong-Wook Song, Hyo-Sik Park, Sang-Don Lee

IEDM, 2002

(Citations:5)

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